Master the More-Moore paradigm and the cutting-edge material innovations redefining the limits of semiconductor miniaturization with this essential roadmap to the future of global microelectronics fabrication.
Table of ContentsPreface
Acknowledgment
1. Junctionless Multigate Field Effect TransistorR. Ouchen, T. Berghout, F. Djeffal and H. Ferhati
1.1 Introduction
1.2 From Single-Gate to Multigate FETs
1.2.1 The Era of Single-Gate FETs
1.2.2 Double-Gate Devices
1.2.2.1 Planar DG-FET
1.2.2.2 Vertical DG FET
1.2.3 Multigate Structures
1.2.3.1 Fin Field-Effect Transistor
1.2.3.2 Tri-Gate FET
1.2.3.3 GAA FETs
1.2.3.4 Surround-Gate Transistor
1.2.3.5 Omega-Gate FET
1.2.3.6 Pi-Gate FET
1.3 Junctionless Multigate FETs
1.3.1 Junctionless Transistors Design
1.3.2 Basic Principle of Junctionless Transistors
1.3.3 Evolution to Junctionless Multigate FETs
1.3.4 Advantages of Junctionless Multigate FET
1.3.5 Challenges and Limitations
1.3.6 Junctionless GAA FET Numerical Simulations
1.4 Machine Learning-Assisted Design of Junctionless GAA FET
1.5 Conclusion
References
2. Heterojunction Field Effect TransistorShahnaz Kossar, Asif Rasool, R. Amiruddin, Syed Abbas Ali, Mohammad Ayaz Ahmad, Nasharath Mapjan, Kasim Sakran Abass and Mir Waqas Alam
2.1 Introduction
2.2 Basic History and Challenges
2.2.1 Overview of Transistor Technology
2.3 Heterojunction-Based Field-Effect Transistors
2.3.1 Principles of Heterojunctions
2.3.2 Types of Heterojunction
2.3.2.1 Type I Heterojunction
2.3.2.2 Type II Heterojunction
2.3.2.3 Type III Heterojunction
2.4 Selection of Material for HFETs
2.4.1 Band Structure in HFETs
2.4.2 Effect of Band Gap on Device Performance
2.4.3 Formation of 2DEG Features
2.4.4 Mechanisms for 2DEG Formation
2.4.5 Implications for HFET Operation
2.5 Conclusion
References
3. Nanosheet Field Effect TransistorP. Suveetha Dhanaselvam, B. Karthikeyan, K. Kavitha, S. Nagarajan, P. Karthikeyan and G. Pradeep Kumar
3.1 Introduction to Nanosheet FETs
3.2 Structural Innovations in Nanosheet FETs
3.3 Fabrication Techniques for Nanosheet FETs
3.4 Performance Advantages of Nanosheet FETs
3.5 Challenges in Nanosheet FET Development
3.6 Applications of Nanosheet FETs
3.7 Conclusion
References
4. Post CMOS Semiconductor Field Effect TransistorVishnudevi N., Thenmozhi T., Vijay M. and P. Suveetha Dhanaselvam
4.1 Introduction
4.1.1 Overview of Semiconductor Devices
4.1.2 Historical Background
4.2 CMOS Technology
4.2.1 Historical Background
4.2.2 Principles of CMOS Technology
4.3 Advancements in Semiconductor Devices
4.3.1 Thermal Transistors
4.3.2 Advanced Materials
4.3.3 3D Integrated Circuits
4.3.4 Technological Trends
4.3.4.1 Integration of Artificial Intelligence (AI)
4.3.4.2 Internet of Things (IoT)
4.3.4.3 5G Technology
4.3.5 Manufacturing Techniques
4.3.5.1 Advanced Packaging
4.3.5.2 In-House Chip Design
4.3.5.3 Sustainable Manufacturing
4.4 Applications of Semiconductor Devices
4.4.1 Consumer Electronics
4.4.2 Digital Applications
4.4.3 Analog Applications
4.4.4 Mixed Signal Applications
4.4.5 Power Management Applications
4.4.6 Automobile Sector
4.4.7 Healthcare
4.5 Future Directions
4.5.1 Research Trends in CMOS Technology
4.5.2 Potential for New Applications
4.5.3 Environmental Impact and Sustainability
4.6 Conclusion
References
5. Underlapped MOSFETs and Its CharacteristicsP. Suveetha Dhanaselvam, B. Karthikeyan, K. Kavitha and G. Pradeep Kumar
5.1 Introduction
5.2 Structure
5.2.1 Analytical Model
5.3 Results and Discussions
5.3.1 Surface Potential
5.3.2 Electric Field
5.4 Conclusion
References
6. Fundamental of Carbon Nanowires and its ApplicationsN. Nagarani, P. Suveetha Dhanaselvam and B. Karthikeyan
6.1 Introduction
6.1.1 The Nanotech Revolution: Carbon Leads the Charge
6.1.2 Carbon Nanowires: The Next Big Thing in Nano
6.2 Properties of Carbon Nanowires
6.2.1 Exceptional Thermal Conductivity
6.2.2 Steelier Than Steel: Exceptional Mechanical Strength
6.2.3 Chemical Stability of CNWs toward Fire
6.2.4 Electric Excellence: Conductivity at the Nanoscale
6.2.5 Quantum Leap: Nanoscale Magic of CNWs
6.3 Fabrication Techniques
6.3.1 Chemical Vapor Deposition
6.3.2 Laser Precision: Ablation and CNW Formation
6.3.3 Electrochemical Approaches to CNWs
6.4 Applications of Carbon Nanowires
6.4.1 Smart Circuits: CNWs in Nanoelectronics
6.5 Ongoing Research and Future Perspectives
6.5.1 Quantum Computing, Aerospace Applications, and Photonics
6.5.2 Next-Generation Photonic Devices and Wearable Technology
6.5.3 Neuromorphic Computing and Green Energy Solutions
6.6 Case Study: Hardware Accelerators Based on CNWS
6.6.1 Carbon Nanotube Transistors and Hardware Accelerators
6.6.2 CNT-Based Hardware Accelerator Operation Mechanism
6.6.3 Advantages of CNT-Based Hardware Accelerators
6.6.4 Challenges in CNT Hardware Accelerator
6.6.5 Future Prospect
6.7 Conclusion
References
7. Junctionless TransistorS. Manikandan, M. Karthigai Pandian and A. Srinivasan
7.1 Introduction
7.1.1 Key Characteristics of Junctionless FETs
7.1.2 Fundamental Principles of Junctionless FETs
7.2 Junctionless FET Structures
7.2.1 Planar Junctionless FET
7.2.2 Nanowire Junctionless FET
7.2.3 Double-Gate Junctionless FET
7.2.4 Surrounding Gate (Cylindrical) JLFET
7.2.5 Double-Material Gate JLFET
7.2.6 Triple-Gate and Gate-All-Around JLFET
7.3 Modeling of Junctionless Fet
7.3.1 Analytical Modeling
7.3.2 Charge Model
7.3.3 Drain Current Model
7.3.4 Linear Region Drain Current
7.3.5 Drain Current in Saturation Region
7.3.6 Characteristics of Junctionless FET
7.4 Challenges and Design Considerations in JLFET Fabrication
7.4.1 Doping Control and Uniformity
7.4.2 Gate Control and Electrostatic Integrity
7.4.3 Material Selection for Gate and Channel
7.4.4 Oxide Quality and Thickness Control
7.4.5 Process Integration with CMOS Technology
References
8. Field-Effect Transistor-Based Biosensors in Medical Field: Principles and Material InnovationsShivangi Srivastava and Sajal Agarwal
8.1 Introduction
8.2 Working Principle of Bio-FET
8.3 Distinct VOCs Related to Diseases and Its Human Body Origins
8.4 Nanomaterials Used for Sensing VOCs
8.5 Conclusion
References
9. Wearable Device Analysis and ApplicationsSarin Vijay Mythry
9.1 Introduction
9.2 Methodology
9.3 Simulation Result
9.4 Conclusion
References
10. Perovskites: Pioneering the Next Generation of Semiconductor TechnologiesP. Suveetha Dhanaselvam, B. Karthikeyan, S. Nagarajan, K. Kavitha, P. Karthikeyan and G. Pradeep Kumar
10.1 Introduction
10.2 The Science of Perovskites
10.2.1 Crystal Structure and Composition
10.2.2 Electronic and Optical Properties
10.2.3 Stability and Defect Tolerance
10.2.4 Defect Tolerance
10.3 Advantages of Perovskites over Traditional Semiconductors
10.4 Applications of Perovskites in Semiconductor Technologies
10.5 Conclusion
References
11. Performance Analysis of Eco‑Friendly Perovskite Solar CellsP. Suveetha Dhanaselvam, B. Karthikeyan, K. Kavitha and G. Pradeep Kumar
11.1 Introduction
11.2 Materials and Methodology
11.3 Performance Analysis
11.4 Conclusion
References
12. Real Time Myocardial Infarction Detection and Localization Using an Advanced VLSI SystemJanani V.G., Suveetha Dhanaselavm P., Vasuki S. and Muneeswari B.
12.1 Introduction
12.1.1 Importance of Early Myocardial Infarction Detection
12.1.2 Motivation for VLSI-Based Solution
12.1.3 Role of Electrocardiograms (ECGS) in Cardio Vascular Diagnostics
12.2 Background and Literature Review
12.2.1 Myocardial Infarction: Causes, Symptoms and Consequences
12.2.2 Diagnostic Approaches for Myocardial Infarction
12.2.3 VLSI in Medical Application
12.3 Proposed VLSI Architecture
12.3.1 Design Objectives
12.3.2 System Overview
12.3.3 Classification Methodology
12.3.4 Implementation Overview
12.4 Performance Analysis
12.4.1 Evaluation Metrics
12.4.2 Experimental Results
12.4.3 Comparison with Existing Systems
12.5 Applications and Practical Deployment
12.5.1 Integration into Medical Devices
12.5.2 Impact on Patient Outcomes
12.5.3 Future Directions
12.6 Conclusion
References
13. Tunnel Field Effect Transistors and its Application as Label-Free BiosensorBasudha Dewan
13.1 Introduction
13.1.1 New Approaches for Upcoming Technology Generations
13.1.2 Tunnel Field-Effect Transistors (Tunnel FETs): A Vital Technique toward Power Harvesting
13.2 Tunnel FET Technology: State of Art
13.3 Band-to-Band Tunneling (BTBT) Current
13.3.1 Reported Work
13.4 Device Architecture and Simulation Deck
13.5 Results and Discussion
13.6 Conclusion
Bibliography
14. Graphene Nanosheet Field Effect TransistorS. Raj Kumar, S. Murugan and T. Esther
14.1 Introduction
14.2 Device Structures and Simulations
14.3 Analytical Modeling
14.3.1 Boundary Conditions
14.3.2 Channel Potential Model
14.3.3 Electric Field Model
14.3.4 Model of Threshold Voltage
14.3.5 Drain Current Model
14.3.6 Transconductance
14.3.7 Integrated Noise
14.4 Result and Discussion
14.5 Conclusion
Bibliography
15. Design and Performance Analysis of 10 T and 28 T Full Adder Using MOSFET and FinFETVarsha Jayaprakash, Boggarapu Lokesh, Aishwarya K. and B. Lakshmi
15.1 Introduction
15.2 Materials and Methods
15.2.1 28 T CMOS Full Adder
15.2.2 10 T GDI CMOS Full Adder
15.2.3 28 T FinFET Full Adder
15.2.4 10 T GDI FinFET Full Adder
15.2.5 Simulation Methodology
15.3 Results and Discussion
15.4 Conclusions
References
16. Investigations of Vital Design Parameters of a Low-Power Amplifying Unit for EEG and Advanced Neuroscience ResearchSarin Vijay Mythry, Shashi Kant Gupta and Sai Kiran O.
16.1 Introduction
16.2 Methodology
16.3 Circuit Design and Description
16.4 Design Specifications
16.5 Simulation and Results
16.6 Output Waveforms
16.7 Conclusion
References
17. Heterojunction Tunnel FET with Graphene NanoribbonRitam Dutta and J. Ajayan
17.1 Introduction
17.2 Simulation Strategy and Calibration
17.3 Results and Discussion
References
18. Hybrid Field Effect TransistorK. Kavitha, P. Suveetha Dhanaselvam, B. Karthikeyan, S. Nagarajan, G. Pradeep Kumar and P. Karthikeyan
18.1 Introduction
18.2 Ferroelectric FETs (FeFETs)
18.3 Tunnel Field-Effect Transistors
18.3.1 Kane’s Model
18.3.2 Tunneling Current Model
18.4 Junctionless FETs
18.5 Concept of Hybrid FET Architecture
18.6 Conclusion
References
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